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Specific Process Knowledge/Thin film deposition/Deposition of Germanium: Difference between revisions

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|10Å to about 2000Å (in total distributed on all loaded wafers)
|10Å to about 2000Å (in total distributed on all loaded wafers)
|10Å to about 3000Å  
|10Å to about 3000Å  
|10Å to about 5000Å
|10Å to about 1000 nm
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
! Deposition rate
! Deposition rate
|From 0.4 Å/s up to about ~2Å/s  
|From 0.4 Å/s up to about ~2Å/s  
|From 5 Å/s up to 10 Å/s  
|5 Å/s
|From 1 Å/s up to 5 Å/s  
|From 1 Å/s up to 5 Å/s  
|-
|-
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