Specific Process Knowledge/Characterization/XRD: Difference between revisions
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With X-Ray Reflectivity measurements, it is possible to obtain information on thickness, density, and both surface and interface roughness on thin films. The technique does not depend on crystal structure and can be used on both amorphous, poly-, and single-crystalline materials. | With X-Ray Reflectivity measurements, it is possible to obtain information on thickness, density, and both surface and interface roughness on thin films. The technique does not depend on crystal structure and can be used on both amorphous, poly-, and single-crystalline materials. | ||
For film thickness measurement, films op to around 100 nm can be measured. You are welcome to try it on thicker films, but please confirm the measurement the first time by use of other equipment. XRR is a special case of a Theta/2Theta measurement. | For film thickness measurement, films op to around 100 nm can be measured. You are welcome to try it on thicker films, but please confirm the measurement the first time by use of other equipment. XRR is a special case of a Theta/2Theta measurement. | ||
Rigaku gives a good explanation of the principles behind the XRR in [[ | Rigaku gives a good explanation of the principles behind the XRR in [[:File:X-ray thin film measurements techniques V X-ray reflectivity measurements.pdf|this paper.]] | ||
==Software for analysis== | ==Software for analysis== | ||