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Specific Process Knowledge/Back-end processing/Polisher CMP: Difference between revisions

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Rkch (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
284 edits
Rkch (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
284 edits
Line 70: Line 70:
*Chemcloth Polishing Cloths
*Chemcloth Polishing Cloths
|-
|-
|style="background:LightGrey; color:black"|Rotation speed
|style="background:LightGrey; color:black"|Rotation
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Thinning: 5-20 rpm
*Plate
*Polishing: 5-80 rpm
*HeadPpuck|-
|-
|style="background:LightGrey; color:black"|Arm sweep
|style="background:LightGrey; color:black"|Arm sweep
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
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