Specific Process Knowledge/Characterization: Difference between revisions
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| width="50" align="center" style="background:#f0f0f0;"|'''[[Specific_Process_Knowledge/Characterization/Thickness_Measurer|Thickness stylus]]''' | | width="50" align="center" style="background:#f0f0f0;"|'''[[Specific_Process_Knowledge/Characterization/Thickness_Measurer|Thickness stylus]]''' | ||
| width="50" align="center" style="background:#f0f0f0;"|'''[[Specific_Process_Knowledge/Characterization/XPS#XPS-ThermoScientific|XPS]]''' | | width="50" align="center" style="background:#f0f0f0;"|'''[[Specific_Process_Knowledge/Characterization/XPS#XPS-ThermoScientific|XPS]]''' | ||
| width="50" align="center" style="background:#f0f0f0;"|'''PL mapper''' | | width="50" align="center" style="background:#f0f0f0;"|'''[[Specific_Process_Knowledge/Characterization/PL_mapper|PL mapper]]''' | ||
| width="50" align="center" style="background:#f0f0f0;"|'''4-point probe''' | | width="50" align="center" style="background:#f0f0f0;"|'''[[Specific_Process_Knowledge/Characterization/4-Point_Probe|4-point probe]]''' | ||
| width="50" align="center" style="background:#f0f0f0;"|'''Probe station''' | | width="50" align="center" style="background:#f0f0f0;"|'''Probe station''' | ||
| width="50" align="center" style="background:#f0f0f0;"|'''XRD''' | | width="50" align="center" style="background:#f0f0f0;"|'''XRD''' | ||