Specific Process Knowledge/Wafer Information: Difference between revisions
| Line 20: | Line 20: | ||
!SSP (single side polished) | !SSP (single side polished) | ||
|2" | |2" | ||
|P | |P(Boron) | ||
|500 µm | |500 µm | ||
|1-20 Ωcm | |1-20 Ωcm | ||
|- | |- | ||
|- | |- | ||
!SSP (single side polished) | !SSP (single side polished) | ||
|4" | |4" | ||
|N+P | |N(Phosphor) +P(Boron) | ||
|525 µm | |525 µm | ||
|1-20 Ωcm | |1-20 Ωcm | ||
| Line 38: | Line 37: | ||
|625 µm | |625 µm | ||
|1-20 Ωcm | |1-20 Ωcm | ||
|- | |||
|- | |||
!SSP (single side polished) | |||
|8" | |||
|N | |||
|725 µm | |||
|1-10 Ωcm | |||
|- | |- | ||
|- | |- | ||