Specific Process Knowledge/Characterization: Difference between revisions

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*[[LabAdviser/CEN/Titan ETEM |Titan ETEM]]
*[[LabAdviser/CEN/Titan ETEM |Titan ETEM]]
*[[LabAdviser/CEN/Tecnai TEM |Tecnai TEM]]
*[[LabAdviser/CEN/Tecnai TEM |Tecnai TEM]]
===Electrical measurements===
*[[/4-Point Probe|4-Point Probe]]
*[[/Probe station|Probe station]]
*[[/III-V ECV-profiler|III-V ECV-profiler (Electrochemical Capacitance-Voltage carrier density profiler)]]


===Various===
===Various===
*[[/Drop Shape Analyzer|Drop Shape Analyzer]]
*[[/Drop Shape Analyzer|Drop Shape Analyzer]]
*[[/4-Point Probe|4-Point Probe]]
*[[/Thickness Measurer|Thickness Measurer]]
*[[/Thickness Measurer|Thickness Measurer]]
*[[/DSC Perkin Elmer|DSC Perkin Elmer - Differential Scanning Calorimetry]]
*[[/DSC Perkin Elmer|DSC Perkin Elmer - Differential Scanning Calorimetry]]
*[[/Probe station|Probe station]]
*[[/Hardness measurement|Hardness tester]]
*[[/Hardness measurement|Hardness tester]]
*[[/KLA-Tencor Surfscan 6420|KLA-Tencor Surfscan 6420]]
*[[/KLA-Tencor Surfscan 6420|KLA-Tencor Surfscan 6420]]
*[[/III-V ECV-profiler|III-V ECV-profiler (Electrochemical Capacitance-Voltage carrier density profiler)]]
*[[/X-Ray Diffractometer|X-Ray Diffractometer ]]
*[[/X-Ray Diffractometer|X-Ray Diffractometer ]]
*[[/XRD|XRD SmartLab]]
*[[/XRD|XRD SmartLab]]

Revision as of 11:22, 26 October 2018

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Overview of characteristics and where to measure it

Optical Micro- scopes SEM (incl. EDX) AFM Stylus profiler Optical profiler Filmtek (reflec- tometer) Ellip- someter Thickness stylus XPS PL mapper 4-point probe Probe station XRD Life time scanner Drop shape analyser Hardness tester Differential Scanning Calorimeter DSC Surfscan IR-camera
Breakdown voltage
Charge carrier life time x
Contact angle hydrophobic/hydrophillic x
Crystallinity x x
Deposition uniformity x x x
Dimensions(in plane) x x (x) (x) x
Dimensions(height) (x) (x) x x x
Electrical conductivity x
Element analysis x x x 4) x 4)
Film stress x x
Imaging x x x x
Material Hardness x
Optical gap x x
Particles x x x x
Phase changes x
Reflectivity x x x 6)
Refractive index x x
Resistivity x
Step coverage x 1) x 1)
Surface roughness x x x
Thermal conductivity
Thin film thickness x 1) x 1) x 2) x 2) x x x x 5) x 3) x
Voids in wafer bonding x x x
Wafer thickness x 1) x 1) x
  1. Using the cross section method
  2. Using the create step method
  3. With known resistivity
  4. Composition information for crystalline materials
  5. Only single layer
  6. Good for characterization of VCSEL structures and DBR mirrors

Choose characterization topic

Choose equipment

AFM

Element analysis

Optical and stylus profilers

Optical microscopes

Optical characterization


SEMs at CEN

SEMs at Danchip

TEMs at CEN

Electrical measurements


Various