Specific Process Knowledge/Etch: Difference between revisions
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*[[/Etching of Silicon Oxide|Silicon Oxide]] | *[[/Etching of Silicon Oxide|Silicon Oxide]] | ||
*[[/Etching of Bulk Glass|Bulk Glass]] - ''Borofloat (pyrex) and fused silica (quartz)'' | *[[/Etching of Bulk Glass|Bulk Glass]] - ''Borofloat (pyrex) and fused silica (quartz)'' | ||
*[[Etching of Silicon Nitride]] | |||
== Choose a dry etch equipment == | == Choose a dry etch equipment == | ||
Revision as of 12:08, 17 October 2007
Choose material to be etched
- Aluminium
- Chromium
- Titanium
- Gold
- Platin
- Polymer
- Silicon
- Silicon Nitride
- Silicon Oxide
- Bulk Glass - Borofloat (pyrex) and fused silica (quartz)
- Etching of Silicon Nitride
Choose a dry etch equipment
Choose a wet etch
- Wet Silicon Nitride Etch
- Wet Silicon Oxide Etch (BHF)
- KOH Etch - Anisotropic silicon etch
- Wet Polysilicon Etch - Isotropic silicon etch
- Wet Aluminium Etch