Specific Process Knowledge/Characterization: Difference between revisions

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==Overview of characteristics and where to measure it==
==Overview of characteristics and where to measure it==
{| {{table}}
{| {{table}}
| align="center" style="background:#f0f0f0;"|''''''
| width="50" align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|'''Microscopes'''
| width="50" align="center" style="background:#f0f0f0;"|'''Microscopes'''
| align="center" style="background:#f0f0f0;"|'''SEM (incl. EDX)'''
| width="50" align="center" style="background:#f0f0f0;"|'''SEM (incl. EDX)'''
| align="center" style="background:#f0f0f0;"|'''AFM'''
| width="50" align="center" style="background:#f0f0f0;"|'''AFM'''
| align="center" style="background:#f0f0f0;"|'''Stylus profiler'''
| width="50" align="center" style="background:#f0f0f0;"|'''Stylus profiler'''
| align="center" style="background:#f0f0f0;"|'''Optical profiler'''
| width="50" align="center" style="background:#f0f0f0;"|'''Optical profiler'''
| align="center" style="background:#f0f0f0;"|'''Filmtek (reflectometer)'''
| width="50" align="center" style="background:#f0f0f0;"|'''Filmtek (reflectometer)'''
| align="center" style="background:#f0f0f0;"|'''Ellipsometer'''
| width="50" align="center" style="background:#f0f0f0;"|'''Ellipsometer'''
| align="center" style="background:#f0f0f0;"|'''Thickness stylus'''
| width="50" align="center" style="background:#f0f0f0;"|'''Thickness stylus'''
| align="center" style="background:#f0f0f0;"|'''XPS'''
| width="50" align="center" style="background:#f0f0f0;"|'''XPS'''
| align="center" style="background:#f0f0f0;"|'''PL mapper'''
| width="50" align="center" style="background:#f0f0f0;"|'''PL mapper'''
| align="center" style="background:#f0f0f0;"|'''4-point probe'''
| width="50" align="center" style="background:#f0f0f0;"|'''4-point probe'''
| align="center" style="background:#f0f0f0;"|'''Probe station'''
| width="50" align="center" style="background:#f0f0f0;"|'''Probe station'''
| align="center" style="background:#f0f0f0;"|'''XRD'''
| width="50" align="center" style="background:#f0f0f0;"|'''XRD'''
| align="center" style="background:#f0f0f0;"|'''Life time scanner'''
| width="50" align="center" style="background:#f0f0f0;"|'''Life time scanner'''
| align="center" style="background:#f0f0f0;"|'''Drop shape analyser'''
| width="50" align="center" style="background:#f0f0f0;"|'''Drop shape analyser'''
| align="center" style="background:#f0f0f0;"|'''Hardness tester'''
| width="50" align="center" style="background:#f0f0f0;"|'''Hardness tester'''
|-
|-
|-style="background:#C0C0C0;"
|-style="background:#C0C0C0;"

Revision as of 14:13, 21 September 2018

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Overview of characteristics and where to measure it

' Microscopes SEM (incl. EDX) AFM Stylus profiler Optical profiler Filmtek (reflectometer) Ellipsometer Thickness stylus XPS PL mapper 4-point probe Probe station XRD Life time scanner Drop shape analyser Hardness tester
Thin film thickness x 1) x 1) x 2) x 2) x x x x 3) x
Defects x x
Wafer thickness x 1) x 1) x
Step coverage x 1) x 1)
Particles x x x
Element analysis x x x 4) x 4)
Surface roughness x x x
Deposition uniformity x x x
Film stress x x
Refractive index x x
Reflectivity x x (x)
Resistivity x
Breakdown voltage
Electrical conductivity x
Thermal conductivity
Optical gap x x
Crystalinity x
Charge carrier life time x
Contact angle hydrofob/hydrofil x
Material Hardness x
  1. Using the cross section method
  2. Using the create step method
  3. With known resistivity
  4. Composition information

Choose characterization topic

Choose equipment

AFM

Element analysis

Optical and stylus profilers

Optical microscopes

Optical characterization


SEM's at CEN

SEM's at Danchip

TEM's at CEN

Various