Specific Process Knowledge/Thin film deposition/Temescal/Acceptance Test: Difference between revisions
Appearance
| Line 13: | Line 13: | ||
Side wall coverage was evaluated in SEM for Ti/Au films deposited at normal incidence (what most users require, which gives no side-wall deposition) and with various degrees of tilt. | Side wall coverage was evaluated in SEM for Ti/Au films deposited at normal incidence (what most users require, which gives no side-wall deposition) and with various degrees of tilt. | ||
===[[:File:Temescal Acceptance Test Results Mar-April-May 2018.pdf| | ===[[:File:Temescal Acceptance Test Results Mar-April-May 2018.pdf|Full acceptance test report here]] === | ||
== Thickness uniformity == | == Thickness uniformity == | ||
| Line 23: | Line 23: | ||
We cannot guarantee that the batch-to-batch thickness reproducibility will always be below 3 % as there may be more drift over longer times. We check the thickness of a Ti/Au deposition every month and ensure that it is within 10 % of the expected value and so far, within in the first half year of using the instrument, the variation has been much less than 10 %. | We cannot guarantee that the batch-to-batch thickness reproducibility will always be below 3 % as there may be more drift over longer times. We check the thickness of a Ti/Au deposition every month and ensure that it is within 10 % of the expected value and so far, within in the first half year of using the instrument, the variation has been much less than 10 %. | ||
== Sheet resistance uniformity == | == Sheet resistance uniformity == | ||
| Line 28: | Line 29: | ||
Note that thickness variation will lead to variation in the sheet resistance, so accurate thickness is important for reproducible sheet resistance values. | Note that thickness variation will lead to variation in the sheet resistance, so accurate thickness is important for reproducible sheet resistance values. | ||
== Ion source == | == Ion source == | ||
| Line 50: | Line 52: | ||
The side wall deposition was clearly stronger for 53 ° tilt than for 17 ° tilt. | The side wall deposition was clearly stronger for 53 ° tilt than for 17 ° tilt. | ||
<gallery> | |||
File:tilt27_sample1-_01.jpg|400px|Side wall deposition on sample deposited with 17 ° tilt | |||
File:tilt53_sample2_01.jpg|400px|Side wall deposition on sample deposited with 53 ° tilt | |||
</gallery> | |||