Specific Process Knowledge/Thin film deposition/Temescal/Acceptance Test: Difference between revisions

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==The Temescal Acceptance test==
==Acceptance test and test results==


Topics:  
Topics:  

Revision as of 13:55, 12 September 2018

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Acceptance test and test results

Topics:

  • Vacuum performance
  • Ion beam etching of SiO2
  • E-beam testing: Ti/Au and Ti/Ni deposition

The uniformity of the ion beam etch was tested on Si wafers with SiO2 coating of a known thickness.

For metal films, the thickness and for Ti/Ni the sheet resistance uniformity were measured. Furthermore the side wall coverage was evaluated in SEM for Ti/Au films deposited at normal incidence (what most users require, which gives no side-wall deposition) and with various degrees of tilt.

Full acceptance test report here: File:Temescal Acceptance Test Results Mar-April-May 2018.pdf

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