Specific Process Knowledge/Etch/III-V ICP/InP-InGaAsP-InGaAs: Difference between revisions
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=== InP etch with Cl2/CH4/Ar 2013=== | === InP etch with Cl2/CH4/Ar 2013=== | ||
Work done by | Work done by Matthew Haines in 2013 <br> | ||
*[[Media:InP_Etch_Presentation_Final_Version-ky-bghe.pdf|InP Etch Presentation by Matthew Haines]] | |||
=== InP/InGaAsP/InGaAs etch 2011 === | === InP/InGaAsP/InGaAs etch 2011 === | ||