Specific Process Knowledge/Thin film deposition/thermalevaporator: Difference between revisions
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!style="background:silver; color:black" align="left" valign="top" rowspan="2"|Performance | !style="background:silver; color:black" align="left" valign="top" rowspan="2"|Performance | ||
|style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"| | |style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"| | ||
*10Å - 1µm* | *10Å - 1µm* | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Deposition rate | |style="background:LightGrey; color:black"|Deposition rate | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | *0.5 or 2 Å/s (Al), 5 Å/s (Ag) | ||
*In general, 0.5-10 Å/s is possible | *In general, 0.5-10 Å/s is possible | ||
*We need to develop a new process for each rate | *We need to develop a new process for each rate | ||