Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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	Many resists can be developed in different developers, CSAR can be developed in: AR 600-546, AR 600-548, ZED N-50 and mix of MIBK and IPA among others.		Many resists can be developed in different developers, CSAR can be developed in: AR 600-546, AR 600-548, ZED N-50 and mix of MIBK and IPA among others.

	CSAR and ZEP520A are in principle the same chemical, however the pretreatment (filtration and temperature control) can differ.		CSAR and ZEP520A are in principle the same chemical, however the pretreatment (filtration and temperature control) can differ.