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Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
2,366 edits
Pevo (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
2,366 edits
Line 51: Line 51:
!Film Thickness
!Film Thickness
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*~10nm - ~0.5µm(>2h)
*~10 nm - ~0.5 µm (>2h)
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*~10nm - ~0.5µm(>2h)
*~10 nm - ~0.5 µm (>2h)
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*~10nm - ~200 nm
*~10 nm - ~200 nm
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* 0nm - 100nm
* 0 nm - 100 nm
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Line 131: Line 131:
*several smaller samples
*several smaller samples
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ALD1:
*1-5 100 mm wafers
*1-5 100 mm wafers
*1-5 150 mm wafers
*1-5 150 mm wafers
*1 200 mm wafer
*Several smaller samples  
*Several smaller samples  
ALD2:
*1 100 mm wafer
*1 150 mm wafer
*1 200 mm wafer
*Several smaller samples
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