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Specific Process Knowledge/Characterization/XRD: Difference between revisions

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0.4x8 mm (Line/Point)
0.4x8 mm (Line/Point)
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!style="background:silver; color:black" align="center" valign="center" rowspan="6"|Goniometer
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Scanning mode
Scanning mode
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Sample stage
Sample stage
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χ
χ:-5~+95°
φ:0~360°
Z:-4~+1 mm
X,Y:±50 mm for a 100 mm wafer
Rx,Ry:-5~+5°
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Target
Sample size
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Cu
Diameter: 150 mm
Thickness: 0~21 mm
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