LabAdviser/314/Microscopy 314-307/SEM/Nova/Micro 4-point probe: Difference between revisions
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In this thesis, a variation of the classic 4-point probe method was used, called micro 4-point probe (μ4PP). This because the electrodes of the 4-point probe can easily scratch a metallic film with thickness in the nm range, thus reaching the substrate and giving inaccurate electrical measurements as result. Fig. 2a shows a μ4PP probe chip. Visible are the ceramic substrate, the Ag/Pd connector strips and the Si base from which the four cantilevers extend. For the movements, the probe chip is connected to a micromanipulator inside a SEM. Aided by SEM imaging, the probe gently touches the thin-film surface in 2-point probe mode without scratching it, followed by the collection of the data in 4-point probe mode (Fig. 2b). | In this thesis, a variation of the classic 4-point probe method was used, called micro 4-point probe (μ4PP). This because the electrodes of the 4-point probe can easily scratch a metallic film with thickness in the nm range, thus reaching the substrate and giving inaccurate electrical measurements as result. Fig. 2a shows a μ4PP probe chip. Visible are the ceramic substrate, the Ag/Pd connector strips and the Si base from which the four cantilevers extend. For the movements, the probe chip is connected to a micromanipulator inside a SEM. Aided by SEM imaging, the probe gently touches the thin-film surface in 2-point probe mode without scratching it, followed by the collection of the data in 4-point probe mode (Fig. 2b). | ||
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[[File:Picture1.png|400px|center|Fig. 1. Schematic representation of the "thin-film structure-property causality" approach for the fabrication of thin-films. The study of the interaction between thin-films is added as fundamental step in the process.]] | |||
= Kleindiek micromanipulator = | = Kleindiek micromanipulator = | ||