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Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,579 edits
Line 250: Line 250:
! style="background:silver; color:black" | [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-3| DRIE-Pegasus 3]]
! style="background:silver; color:black" | [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-3| DRIE-Pegasus 3]]
! style="background:silver; color:black" | [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4| DRIE-Pegasus 4]]
! style="background:silver; color:black" | [[Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4| DRIE-Pegasus 4]]
|- valign="top"
! style="background:Whitesmoke; color:black" | Purpose (current or intended)
| style="background:WhiteSmoke; color:black" | 4" silicon etch workhorse
| style="background:WhiteSmoke; color:black"| Research tool with very limited number of users
| style="background:WhiteSmoke; color:black"| 6" silicon etch workhorse
| style="background:WhiteSmoke; color:black"| 6" dielectric etcher
|- valign="top"
|- valign="top"
! style="background:lightgrey; color:black" | Manufactured
! style="background:lightgrey; color:black" | Manufactured
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