Jump to content

Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions

Choi (talk | contribs)
Choi (talk | contribs)
Line 52: Line 52:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*:[http://labmanager.danchip.dtu.dk/d4Show.php?id=1897&mach=64 see APV here]
*:[http://labmanager.danchip.dtu.dk/d4Show.php?id=1897&mach=64 see APV here]
*:[http://kemibrug.dk/KBA/CAS/106231/?show_KBA=1&portaldesign=1 see KBA here]
*:[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhERkZMSkhFR1RkJWMyJTg3JTdjdiVjMiU4MyU3ZSVjMiU4OHYlYzIlODklN2UlYzIlODQlYzIlODMlYzIlODglNWVZUkk=#K see SDS here]
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*:[http://labmanager.danchip.dtu.dk/d4Show.php?id=2479&mach=146 see APV here]
*:[http://labmanager.danchip.dtu.dk/d4Show.php?id=2479&mach=146 see SDS here]
*:[http://kemibrug.dk/KBA/CAS/100648/?lang=da&show_KBA=1&portaldesign=1 see KBA here]
*:[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhERkZMSkhOSVRkJWMyJTg3JTdjdiVjMiU4MyU3ZSVjMiU4OHYlYzIlODklN2UlYzIlODQlYzIlODMlYzIlODglNWVZUkk=#K see SDS here]
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*:[http://labmanager.danchip.dtu.dk/d4Show.php?id=1897&mach=64 see APV here]
*:[http://labmanager.danchip.dtu.dk/d4Show.php?id=1897&mach=64 see APV here]
*:[http://kemibrug.dk/KBA/CAS/106534/?show_KBA=1&portaldesign=1 see KBA here]
*:[http://kemibrug.dk/KBA/CAS/106534/?show_KBA=1&portaldesign=1 see SDS here]
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance