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Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,579 edits
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!style="background:silver; color:black;" align="center" valign="center" width="80" rowspan="2"|Purpose  
!style="background:silver; color:black;" align="center" valign="center" width="80" rowspan="2"|Purpose  
|style="background:LightGrey; color:black"| Primary
|style="background:Whitesmoke; color:black"| Primary
|style="background:WhiteSmoke; color:black"|  
|style="background:WhiteSmoke; color:black"|  
* Dry etching of silicon
* Dry etching of silicon
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