Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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The recipes are divided into different developer and development times. | The recipes are divided into different developer and development times. | ||
The recipes 546 are short for AR 600-546 and N-50 is short for ZED N-50. | The recipes 546 are short for AR 600-546 and N-50 is short for ZED N-50.<br> | ||
After the developer there is a time indication eg. 10s, 30s, 60s ect. | After the developer there is a time indication eg. 10s, 30s, 60s ect. | ||
Since this system is a spray nozzle that creates a puddle of developer on the substrate the spray is on for 10s. to cover any type of substrates, however this procedure starts the actual development, and the "idle" time is hence shortened accordingly. | Since this system is a spray nozzle that creates a puddle of developer on the substrate the spray is on for 10s. to cover any type of substrates, however this procedure starts the actual development, and the "idle" time is hence shortened accordingly. | ||