Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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The recipes | The recipes are divided into different developer and development times. | ||
The recipes 546 are short for AR 600-546 and N-50 is short for ZED N-50. | |||
After the developer there is a time indication eg. 10s, 30s, 60s ect. | |||
Since this system is a spray nozzle that creates a puddle of developer on the substrate the spray is on for 10s. to cover any type of substrates, however this procedure starts the actual development, and the "idle" time is hence shortened accordingly. | |||
The system is setup so that 10s. in the Developer E-beam correlates to 10s. in a beaker, however all designs are different and larger or smaller structures may need different development times. | |||
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= Proximity Error Correction = | = Proximity Error Correction = | ||