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== Development ==
= Development =
 
There are many different developers for different E-beam resist, but since CSAR and ZEP520A are the most used at Danchip, we have installed a semi automatic puddle developer: '''Developer E-beam''' in E-4.
 
To accommodate most users, this tool uses developers: AR 600-546 for development of CSAR 6200 resist series and ZED N-50 for ZEP520A resists and IPA as a rinsing step.
Intermediate results indicate that using ZED N-50 for CSAR 6200 series resist will introduce an elevated amount of residues, and vice verva for AR 600 - 546 used on ZEP 520A, but it is inconclusive.
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We therefor recommend to use:
*ZED N-50 for Zep520A
*AR 600-546 for CSAR 6200 series
 
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The recipes


There are many different developers for different E-beam resist, but since CSAR and ZEP520 A are the most used, we have installed a semi automatic


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