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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions

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==Resolution==
==Resolution==
The pixel-size of the DMD in the ligner: Maskless 01 is 0.5µmX0.5µm (at the sample surface). The lithographic resolution of the machine is 1µm on paper, which was demonstrated in the acceptance test after installation using a resist thickness of 0.5µm. This result has later been confirmed. In 1.5µm thick resist, the resolution is around 2µm.
The pixel-size of the DMD in the ligner: Maskless 01 is 0.5µm X 0.5µm (at the sample surface). The lithographic resolution of the machine is 1µm on paper, which was demonstrated in the acceptance test after installation using a resist thickness of 0.5µm. This result has later been confirmed. In 1.5µm thick resist, the resolution is around 2µm.


The table below shows the result of a resolution test using 1.5µm and 0.5µm positive resist. For 1.5µm resist the resolution is 2µm, maybe even a little lower, while it is 1µm, or at least close to, for 0.5µm resist. The optimal dose depends on the designed structures; dots require a lower dose in order to print to size than lines. In the case of a dark field design, trenches would probably require a lower dose in order to print to size than lines, while holes would require a higher dose to print than trenches.
The table below shows the result of a resolution test using 1.5µm and 0.5µm positive resist. For 1.5µm resist the resolution is 2µm, maybe even a little lower, while it is 1µm, or at least close to, for 0.5µm resist. The optimal dose depends on the designed structures; dots require a lower dose in order to print to size than lines. In the case of a dark field design, trenches would probably require a lower dose in order to print to size than lines, while holes would require a higher dose to print than trenches.