Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions
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At the end of (4") substrate detection, the sample is scanned twice along the flat, in order to determine the substrate rotation. This angle will be presented in the exposure panel along with the option to expose the design rotated in order to compensate for this angle, i.e. aligned to the flat. | At the end of (4") substrate detection, the sample is scanned twice along the flat, in order to determine the substrate rotation. This angle will be presented in the exposure panel along with the option to expose the design rotated in order to compensate for this angle, i.e. aligned to the flat. | ||
<br/>The flat alignment accuracy has been measured to be 0±0.1° (1.7mRad) quite consistently. Out of a total of 15 exposures, 13 showed misalignment of 0.1° or better, despite initial sample rotations exceeding 5°. | <br/>The flat alignment accuracy has been measured to be 0±0.1° (1.7mRad) quite consistently. Out of a total of 15 exposures, 13 showed misalignment of 0.1° or better, despite initial sample rotations exceeding 5°. | ||
Please observe, that one should not select the flat alignment option if 'Expose Crosses' is used. The design will be rotated, but the crosses will not, resulting in a rotation error equal to the flat angle. | |||
=Alignment= | =Alignment= | ||