Specific Process Knowledge/Etch/DRIE-Pegasus/System-description: Difference between revisions
| Line 80: | Line 80: | ||
* When the pressure changes (the point on the X axis where the 10 mTorr regime starts), the matching network responds and settles into new positions with a minimum power. SPTS labels this a 'sweet spot'. | * When the pressure changes (the point on the X axis where the 10 mTorr regime starts), the matching network responds and settles into new positions with a minimum power. SPTS labels this a 'sweet spot'. | ||
* The positions of Load and Tune change as the pressure is gradually increased to 90 mTorr. The change is, in fact, very significant compared to when changes in other process parameters (such as power, gas flow or temperature) are varied during processing in a similar experiment. | * The positions of Load and Tune change as the pressure is gradually increased to 90 mTorr. The change is, in fact, very significant compared to when changes in other process parameters (such as power, gas flow or temperature) are varied during processing in a similar experiment. | ||
'''What happens in a Bosch process where the plasma conditions change every few seconds?''' | |||