Specific Process Knowledge/Thin film deposition/Deposition of Chromium: Difference between revisions
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|1Å/s to 5Å/s | |1Å/s to 5Å/s | ||
|10Å/s to 15Å/s | |10Å/s to 15Å/s | ||
|. | |Depending on process parameters, see [[Sputtering of Cr in Wordentec|here.]] | ||
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