Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions

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-Aligner: Maskless 01 is not a direct writer.
+Aligner: Maskless 01 is not a direct writer. In the maskless aligner, the exposure light is passed through a spatial light modulator, much like in a projektor, and projected onto the substrate, thus exposing an area of the design at a time. The wafer is exposed by stepping the exposure field across the wafer.
-The maskless aligner uses a spatial light modulator, much like in a projektor, and exposes an area of the design at a time. The wafer is exposed by stepping the exposure field across the wafer
+The light source is a 10W 365nm LED with a FWHM of 8nm. The spacial light modulator is an 800X600 pixel digital micromirror device. The individual mirrors of the DMD are switched in order to represent the design, and are timed in order to yield the desired exposure dose, while taking into account illumination uniformity, soft-stitching, and possibly also sub-pixel features. This image is projected onto the substrate using a lens.
 =Process Parameters=