Specific Process Knowledge/Etch/Etching of Silicon Nitride: Difference between revisions
| Line 112: | Line 112: | ||
*<nowiki>#</nowiki>1-25 4"-6" wafers | *<nowiki>#</nowiki>1-25 4"-6" wafers | ||
| | | | ||
*As many small samples as can be fitted on the 100mm carrier | *As many small samples as can be fitted on the 100mm carrier (bad/no cooling!) | ||
*<nowiki>#</nowiki>1 100mm wafer (or smaller with carrier) | *<nowiki>#</nowiki>1 100mm wafer (or smaller with carrier) | ||
*<nowiki>#</nowiki>1 150mm wafer (only when the system is set up for 150mm) | *<nowiki>#</nowiki>1 150mm wafer (only when the system is set up for 150mm) | ||