Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions
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==Defocus== | ==Defocus== | ||
The optimal defocus setting is probably a function of the resist thickness, but for 1.5µm resist, a defocus of -4 seems to be optimal. | The optimal defocus setting is probably a function of the resist thickness, but for 1.5µm resist, a defocus of -4 seems to be optimal. | ||
==Writing speed== | |||
Please see the section [[Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_01_processing#Writing_speed|below]]. | |||
=Substrate positioning= | =Substrate positioning= | ||