Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions

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 ==Design philosophy==
-In order to effectively use the Aligner: Maskless 01, we need to steer away from the "as many variations of the design as possible" approach typically used in mask design when the design of a device is in it's test phase. Instead, we should print only one or a few devices at a time, and iterate the design based on the result of that test, thus truly making use of the rapid prototyping capabilities of the maskless aligner.
+In order to effectively use the Aligner: Maskless 01, we need to steer away from the "as many variations of the design as possible" approach typically used in mask design when the design of a device is in it's test phase. Instead, we should print only one or a few devices at a time, and iterate the design based on the performance of that device, thus truly making use of the rapid prototyping capabilities of the maskless aligner.
 Alternatively, we should split our design into two parts; one comprising of all the parts of the device that remain constant through the iterations, e.g. contacts, and the other part being the part of the device that is subject to design optimization. The first part should be printed using a mask aligner, while the other design can be printed much faster on the maskless aligner due to the significantly reduced exposure area. This method is especially useful if the two exposures can be done in the same layer of resist using mix-and-match resist/process.