Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions
Appearance
| Line 302: | Line 302: | ||
|AZ 5214E | |AZ 5214E | ||
Exposed + developed | Exposed + developed | ||
|[[Image:5214E DEV HighResolution crop.jpg| | |[[Image:5214E DEV HighResolution crop.jpg|350px]] | ||
|[[Image:5214E DEV overview crop.jpg| | |[[Image:5214E DEV overview crop.jpg|350px]] | ||
|- | |- | ||
| Line 309: | Line 309: | ||
|AZ MiR 701 | |AZ MiR 701 | ||
Exposed only | Exposed only | ||
|[[Image:MiR HighResolution crop.jpg| | |[[Image:MiR HighResolution crop.jpg|350px]] | ||
|[[Image:MiR overview crop.jpg| | |[[Image:MiR overview crop.jpg|350px]] | ||
|- | |- | ||
| Line 316: | Line 316: | ||
|AZ 5214E | |AZ 5214E | ||
Exposed only | Exposed only | ||
|[[Image:5214E HighResolution crop.jpg| | |[[Image:5214E HighResolution crop.jpg|350px]] | ||
|[[Image:5214E Overview crop.jpg| | |[[Image:5214E Overview crop.jpg|350px]] | ||
|- | |- | ||
| Line 323: | Line 323: | ||
|AZ nLOF 2020 | |AZ nLOF 2020 | ||
Exposed + PEB | Exposed + PEB | ||
|[[Image:NLOF PEB HighResolution crop.jpg| | |[[Image:NLOF PEB HighResolution crop.jpg|350px]] | ||
|[[Image:NLOF PEB overview crop.jpg| | |[[Image:NLOF PEB overview crop.jpg|350px]] | ||
|} | |} | ||