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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions

Taran (talk | contribs)
Taran (talk | contribs)
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|AZ 5214E
|AZ 5214E
Exposed + developed
Exposed + developed
|[[Image:5214E DEV HighResolution crop.jpg|250px]]
|[[Image:5214E DEV HighResolution crop.jpg|350px]]
|[[Image:5214E DEV overview crop.jpg|250px]]
|[[Image:5214E DEV overview crop.jpg|350px]]


|-
|-
Line 309: Line 309:
|AZ MiR 701
|AZ MiR 701
Exposed only
Exposed only
|[[Image:MiR HighResolution crop.jpg|250px]]
|[[Image:MiR HighResolution crop.jpg|350px]]
|[[Image:MiR overview crop.jpg|250px]]
|[[Image:MiR overview crop.jpg|350px]]


|-
|-
Line 316: Line 316:
|AZ 5214E
|AZ 5214E
Exposed only
Exposed only
|[[Image:5214E HighResolution crop.jpg|250px]]
|[[Image:5214E HighResolution crop.jpg|350px]]
|[[Image:5214E Overview crop.jpg|250px]]
|[[Image:5214E Overview crop.jpg|350px]]


|-
|-
Line 323: Line 323:
|AZ nLOF 2020
|AZ nLOF 2020
Exposed + PEB
Exposed + PEB
|[[Image:NLOF PEB HighResolution crop.jpg|250px]]
|[[Image:NLOF PEB HighResolution crop.jpg|350px]]
|[[Image:NLOF PEB overview crop.jpg|250px]]
|[[Image:NLOF PEB overview crop.jpg|350px]]


|}
|}