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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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==Defocus==
==Defocus==
The optimal defocus setting is probable a function of the resist thickness, but for 1.5µm resist, a defocus of -4 seems to be optimal.
The optimal defocus setting is probably a function of the resist thickness, but for 1.5µm resist, a defocus of -4 seems to be optimal.


=Substrate positioning=
=Substrate positioning=
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