Specific Process Knowledge/Characterization/Profiler: Difference between revisions

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===A rough overview of the performance of Tencor P1 stylus profiler===
===Overview of the performance of Tencor P1 stylus profiler===


{| border="2" cellspacing="0" cellpadding="10"  
{| border="2" cellspacing="0" cellpadding="10"  
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Line scan x: Full substrate size
Line scan x: Full substrate size
|-
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Scan range z
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Scan range z
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
<100 Å to ~0.3 mm
<100 Å to ~0.3 mm
|-
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Resolution xy
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Resolution xy
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
up to 5900 data points per profile
up to 5900 data points per profile
|-
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Resolution z
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Resolution z
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
1Å or 25Å
1Å or 25Å
|-
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Max. scan depth as a function of trench width W
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Max. scan depth as a function of trench width W
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
0.87(W[µm]-5µm)
0.87(W[µm]-5µm)
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*up to 4"
*up to 4"
|-
|-
|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Substrate material allowed
|style="background:silver; color:black"|
| style="background:LightGrey; color:black"|Substrate material allowed
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*In principle all materials
*In principle all materials
|-  
|-  
|}
|}
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==Comparing the profilers==
==Comparing the profilers==
Take a look at the [[Specific Process Knowledge/Characterization/Topographic measurement|topographic measurement]] page.
Take a look at the [[Specific Process Knowledge/Characterization/Topographic measurement|topographic measurement]] page.

Revision as of 08:32, 10 July 2008

Dektak 8 stylus profiler

Dektak8: positioned in cleanroom 4 - glass cage no. 3

Dektak 8 stylus profiler is a product of Veeco Instruments. It is usable for profiling surfaces of samples with structures in the micrometer range. It can measure in a specific point found with help from high magnification video cameras or it can be programmed to measure several points defined with respect to some deskew points. It can also be used for stress measurements of thin films by measuring the wafer bow.

To get some product information and some tips and tricks from the vendor take a look at Veeco's homepage [1]

A rough overview of the performance of Dektak 8 stylus profiler

Purpose Profiler for measuring micro structures.
  • Single point profiles
  • Wafer mapping
  • Stress measurements by measuring wafer bow
  • Surface roughness on a line scan
Performance Scan range xy

Line scan x: 50 µm to 200 mm

Scan range z

50 Å to 262 µm

Resolution xy

down to 0.067 µm

Resolution z

1Å, 10Å or 20Å

Max. scan depth as a function of trench width W

1.2(W[µm]-5µm)

Hardware settings Tip radius
  • 5 µm 45o cone
Substrates Substrate size
  • up to 8"
Substrate material allowed
  • In principle all materials

Tencor stylus profiler

Tencor: positioned in cleanroom 4 - glass cage no. 3

Tencor P1 stylus profiler is a product of KLA-Tencor Corporation. It is usable for profiling surfaces of samples with structures in the micrometer range. It can measure in a specific point found with help from a high magnification video camera. It can also be used for stress measurements of thin films by measuring the wafer bow.

It is a very old system and should be treated with care.

Overview of the performance of Tencor P1 stylus profiler

Purpose Profiler for measuring micro structures.
  • Single point profiles
  • Stress measurements by measuring wafer bow
  • Surface roughness on a line scan
Performance Scan range xy

Line scan x: Full substrate size

Scan range z

<100 Å to ~0.3 mm

Resolution xy

up to 5900 data points per profile

Resolution z

1Å or 25Å

Max. scan depth as a function of trench width W

0.87(W[µm]-5µm)

Hardware settings Tip radius
  • 5 µm 60o cone
Substrates Substrate size
  • up to 4"
Substrate material allowed
  • In principle all materials

Comparing the profilers

Take a look at the topographic measurement page.