Specific Process Knowledge/Lithography/EBeamLithographyManual: Difference between revisions
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== Rough estimation of exposure time == | == Rough estimation of exposure time == | ||
[[ | [[Image:old_and_new_column_beam_size_in_one_page_March172019.jpg|400px|right|]] | ||
Based on the equations above, a rough estimate of the exposure time is easily calcualted. In the second sheet of the e-beam logbook, a simple program for calculating the scan speed frequency and an estimation of the exposure time can be found. Note, that the actual writing time will exceed the exposure-time, as the exposure-time calculation doesn’t include pre-calibrations and stage movement during exposure. | Based on the equations above, a rough estimate of the exposure time is easily calcualted. In the second sheet of the e-beam logbook, a simple program for calculating the scan speed frequency and an estimation of the exposure time can be found. Note, that the actual writing time will exceed the exposure-time, as the exposure-time calculation doesn’t include pre-calibrations and stage movement during exposure. | ||