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Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions

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*Boronfloat and quartz: ~3-4 μm/min
*Boronfloat and quartz: ~3-4 μm/min
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*A little higher etch rates than BHF
*Around 110 nm/min
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|style="background:LightGrey; color:black"|Lifetime of photoresist
|style="background:LightGrey; color:black"|Lifetime of photoresist
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