Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions
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=Substrate positionning= | =Substrate positionning= | ||
During load, the machine will focus on the surface of the sample. Then, using the pneumatic focusing mechanism, it will detect the edges of the sample ( | During load, the machine will focus on the surface of the sample. Then, using the pneumatic focusing mechanism, it will detect the edges of the sample (this function dependes on the substrate template used) in order to determine the center of the sample. The following results rapport findings using the "4 inch wafer" template on a standard 100mm Si substrate. | ||
==Substrate centering== | ==Substrate centering== | ||