Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions
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<br/>The deviations (±) given for the results here are calculated as half the range of measurements. If the range is small, the measurement uncertainty is used in stead. | <br/>The deviations (±) given for the results here are calculated as half the range of measurements. If the range is small, the measurement uncertainty is used in stead. | ||
<br/>The samples used for these tests are 100mm Si wafers coated with a 1.5µm layer of the positive tone resist AZ 5214E. | <br/>The samples used for these tests are 100mm Si wafers coated with a 1.5µm layer of the positive tone resist AZ 5214E. | ||
The conclusion to the tests are that the stitching accuracy of the Aligner: Maskless 01 is ±0.1µm. The machine-to-self overlay accuracy is ±0.5µm (an alignment error of -2µm in X must be compensated, but this error may be subject to machine calibration). The machine-to-machine overlay accuracy could not be determined. | |||
==Stitching== | ==Stitching== | ||