Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions
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!colspan="2" align="center"| | !colspan="2" align="center"| | ||
!Shift median [µm] | !Shift median [µm] | ||
! | !Misalignment [µm] | ||
!Run-out [ppm] | !Run-out (gain) [ppm] | ||
!Rotation [ppm] | !Rotation [ppm] | ||
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!Shearing [mRad] | !Shearing [mRad] | ||
!Shift median [µm] | !Shift median [µm] | ||
! | !Misalignment [µm] | ||
!Run-out [ppm] | !Run-out (gain) [ppm] | ||
!Rotation [ppm] | !Rotation [ppm] | ||
|- | |- | ||
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!Shearing [mRad] | !Shearing [mRad] | ||
!Shift median [µm] | !Shift median [µm] | ||
! | !Misalignment [µm] | ||
!Run-out [ppm] | !Run-out (gain) [ppm] | ||
!Rotation [ppm] | !Rotation [ppm] | ||
|- | |- | ||