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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions

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=Alignment=
=Alignment=
The alignment accuracy of the Aligner: Maskless 01 is a combination of the position accuracy of the stage, the accuracy of the alignment mark detection, and the accuracy of the pattern already on the wafer (first print).
The alignment accuracy of the Aligner: Maskless 01 is a combination of the position accuracy of the stage, the accuracy of the alignment mark detection, and the accuracy of the pattern already on the wafer (first print).
<br/> By measuring the stitching accuracy between two layers printed on the same substrate (without unloading the substrate), we can assess the stage accuracy. By aligning to a pattern previously exposed by the Aligner: Maskless 01, we can assess the mark detection accuracy. And finally, by aligning to a pattern exposed on a mask aligner, we can assess the mask-less aligner's ability to compensate for any scaling and orthogonality errors between the two machines.
<br/> By measuring the stitching accuracy between two layers printed on the same substrate (without unloading the substrate), we can assess the stage accuracy. By aligning to a pattern previously exposed by the Aligner: Maskless 01, we can assess the mark detection accuracy. And finally, by aligning to a pattern exposed on a mask aligner, we can assess the mask-less aligner's ability to compensate for any scaling and orthogonality errors between the two machines.  


==Stitching==
==Stitching==
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!Median [µm]
!Error [µm]
!Run-out / Scaling [ppm]
!Rotation [ppm]
|-
|-
|-style="background:WhiteSmoke; color:black"
|X
|-0.03±0.05
|0.01±0.05
|1.00±2.33
|0.00±1.18
|-
|-style="background:WhiteSmoke; color:black"
|Y
|-0.05±0.05
|-0.07±0.05
|0.42±2.33
|0.00±1.18
|}


==Overlay==
==Overlay==