Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions
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==Flat alignment== | ==Flat alignment== | ||
At the end of the substrate detection, the sample is scanned twice along the flat, in order to determine the substrate rotation. This angle will be presented in the exposure panel along with the option to expose the design rotated in order to compensate for this angle, i.e. aligned to the flat. | At the end of the substrate detection, the sample is scanned twice along the flat, in order to determine the substrate rotation. This angle will be presented in the exposure panel along with the option to expose the design rotated in order to compensate for this angle, i.e. aligned to the flat. | ||
<br/>The flat alignment accuracy has been measured to be 0±0.1° quite consistently. Out of a total of 13 exposures, only were misaligned by more than 0.1° | <br/>The flat alignment accuracy has been measured to be 0±0.1° quite consistently. Out of a total of 13 exposures, only two were misaligned by more than 0.1° | ||
=Alignment= | =Alignment= | ||