Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions
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==Exposure dose== | ==Exposure dose== | ||
The exposure dose needed inn the Aligner: Maskless 01 seems to follow the dose needed to process the same substrate in KS Aligner. As doses get higher, there is a tendency for the dose needed in the Aligner: Maskless 01 to exceed the dose needed in KS Aligner. | |||
==Defocus== | ==Defocus== | ||
=Substrate positionning= | =Substrate positionning= | ||