Specific Process Knowledge/Etch/DRIE-Pegasus/Etch 3 dimensional silicon microstructures: Difference between revisions
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* ''This work was done by Henri Jansen and Bingdong Chang in 2017;'' | * ''This work was done by Henri Jansen and Bingdong Chang in 2017;'' | ||
Revision as of 12:52, 26 October 2017
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- This work was done by Henri Jansen and Bingdong Chang in 2017;
- This page was last edited by Bingdong Chang 24 October 2017.
By combining anisotropic Bosch process and isotropic etch process, 3 dimensional structures can be fabricated using DRIE-Pegasus, below is an example to show how 3D "sausage-chain-like" micropillars can be achieved. The patterns were defined with DUV lithography (1µm diameter structures with 2µm pitch size), the resist used was 750nm KRF M230Y positive DUV resist.
- Recipe to achieve sausage-chain-like micropillars
- SEM images of 3D sausage-chain-like micropillars
Using the similar methods, other types of 3D microstructures can be fabricated, below are some silicon structures etched with UV resist as a mask, the lithography step was performed with Aligner Maskless, with 1.5µm thick AZ nlof negative resist or 1.5µm AZ 5214 positive resist.
- SEM images of other kinds of 3D silicon microstructures
For more details, please contact Henri Jansen (henrija@dtu.dk) or Bingdong Chang (bincha@dtu.dk)