Specific Process Knowledge/Thin film deposition/thermalevaporator: Difference between revisions
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[[Image:IMG_2592_edit.jpg|300x300px|thumb| Positioned in cleanroom A-1.]] | [[Image:IMG_2592_edit.jpg|300x300px|thumb| Positioned in cleanroom A-1.]] | ||
The main purpose for the thermal evaporator is to | The main purpose for the thermal evaporator is to deposit Al for removing charging of the restsit when doing EBL on isolerede substrate. | ||
It is no only usable for Al deposition. The thermal evaporator have room for two boats and there by the possibility to make thinfilms of two different metals. At the moment not that many metals have been test and made a recipe for. Right now is is only Al and Ag that can be used. | It is no only usable for Al deposition. The thermal evaporator have room for two boats and there by the possibility to make thinfilms of two different metals. At the moment not that many metals have been test and made a recipe for. Right now is is only Al and Ag that can be used. | ||