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| | [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/PrD-4 | 1]] <!-- link processes --> | | | [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/PrD-4 | 1]] <!-- link processes --> |
| | Best one so far! <!-- keywords --> | | | Best one so far! <!-- keywords --> |
| |-
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| |}
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| == Polysilicon etch ==
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|
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|
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| {| border="1" cellpadding="1" cellspacing="0" style="text-align:center;"
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| |-
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| ! rowspan="2" width="100"| Recipe description
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| ! rowspan="2" width="20"| Name
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| ! rowspan="2" width="20"| Temp.
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| ! colspan="6" | Deposition step
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| ! colspan="7" | Etch step
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| ! colspan="3" | Comments
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| |-
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| ! Time
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| ! Pres.
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| ! C<sub>4</sub>F<sub>8</sub>
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| ! SF<sub>6</sub>
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| ! O<sub>2</sub>
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| ! Coil
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| ! Time
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| ! Pres.
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| ! C<sub>4</sub>F<sub>8</sub>
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| ! SF<sub>6</sub>
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| ! O<sub>2</sub>
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| ! Coil
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| ! Platen
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| ! Showerhead
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| ! Runs
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| ! width="100" | Key words
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| |-
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| ! rowspan="7" | Polysilicon etch <!-- recipe name -->
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| ! polySi etch DUV mask <!-- step -->
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| | 30 <!-- chiller temp -->
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| ! 2.3 <!-- dep time -->
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| | 10 <!-- dep pressure -->
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| | 50 <!-- C4F8 flow -->
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| | 0 <!-- SF6 flow -->
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| | 0 <!-- O2 flow -->
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| | 600 <!-- coil power -->
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| | 5.0 <!-- etch time -->
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| | 10 <!-- etch pressure -->
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| | 20 <!-- C4F8 flow -->
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| | 60 <!-- SF6 flow -->
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| | 5 <!-- O2 flow -->
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| | 400 <!-- coil power -->
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| | 40 <!-- platen power -->
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| ! Old <!-- Showerhead -->
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| | [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cduv | 1]] <!-- link processes -->
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| | Slightly over-etching to ensure complete absence of grass <!-- keywords -->
| |
| |-
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| | polySi etch DUV mask <!-- step -->
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| | 30 <!-- chiller temp -->
| |
| | 2.3 <!-- dep time -->
| |
| | 10 <!-- dep pressure -->
| |
| | 50 <!-- C4F8 flow -->
| |
| | 0 <!-- SF6 flow -->
| |
| | 0 <!-- O2 flow -->
| |
| | 600 <!-- coil power -->
| |
| | 5.0 <!-- etch time -->
| |
| | 10 <!-- etch pressure -->
| |
| | 20 <!-- C4F8 flow -->
| |
| | 60 <!-- SF6 flow -->
| |
| | 5 <!-- O2 flow -->
| |
| | 400 <!-- coil power -->
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| | 40 <!-- platen power -->
| |
| ! New <!-- Showerhead -->
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| | [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cduv | 1]] <!-- link processes -->
| |
| | <!-- keywords -->
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| |-
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| | Cpoly1 <!-- step -->
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| | 30 <!-- chiller temp -->
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| ! 1.2 <!-- dep time -->
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| | 10 <!-- dep pressure -->
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| | 50 <!-- C4F8 flow -->
| |
| | 0 <!-- SF6 flow -->
| |
| | 0 <!-- O2 flow -->
| |
| | 600 <!-- coil power -->
| |
| | 5.0 <!-- etch time -->
| |
| | 10 <!-- etch pressure -->
| |
| | 20 <!-- C4F8 flow -->
| |
| | 60 <!-- SF6 flow -->
| |
| | 5 <!-- O2 flow -->
| |
| | 400 <!-- coil power -->
| |
| | 40 <!-- platen power -->
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| ! New <!-- Showerhead -->
| |
| | [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly1 | 1]] <!-- link processes -->
| |
| | Very aggressive, unusable <!-- keywords -->
| |
| |-
| |
| | Cpoly2 <!-- step -->
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| | 30 <!-- chiller temp -->
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| ! 1.4 <!-- dep time -->
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| | 10 <!-- dep pressure -->
| |
| | 50 <!-- C4F8 flow -->
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| | 0 <!-- SF6 flow -->
| |
| | 0 <!-- O2 flow -->
| |
| | 600 <!-- coil power -->
| |
| | 5.0 <!-- etch time -->
| |
| | 10 <!-- etch pressure -->
| |
| | 20 <!-- C4F8 flow -->
| |
| | 60 <!-- SF6 flow -->
| |
| | 5 <!-- O2 flow -->
| |
| | 400 <!-- coil power -->
| |
| | 40 <!-- platen power -->
| |
| ! New <!-- Showerhead -->
| |
| | [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly2 | 1]] <!-- link processes -->
| |
| | <!-- keywords -->
| |
| |-
| |
| | Cpoly3 <!-- step -->
| |
| | 30 <!-- chiller temp -->
| |
| ! 1.6 <!-- dep time -->
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| | 10 <!-- dep pressure -->
| |
| | 50 <!-- C4F8 flow -->
| |
| | 0 <!-- SF6 flow -->
| |
| | 0 <!-- O2 flow -->
| |
| | 600 <!-- coil power -->
| |
| | 5.0 <!-- etch time -->
| |
| | 10 <!-- etch pressure -->
| |
| | 20 <!-- C4F8 flow -->
| |
| | 60 <!-- SF6 flow -->
| |
| | 5 <!-- O2 flow -->
| |
| | 400 <!-- coil power -->
| |
| | 40 <!-- platen power -->
| |
| ! New <!-- Showerhead -->
| |
| | [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly3 | 1]] <!-- link processes -->
| |
| | <!-- keywords -->
| |
| |-
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| | Cpoly4 <!-- step -->
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| | 30 <!-- chiller temp -->
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| ! 1.8 <!-- dep time -->
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| | 10 <!-- dep pressure -->
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| | 50 <!-- C4F8 flow -->
| |
| | 0 <!-- SF6 flow -->
| |
| | 0 <!-- O2 flow -->
| |
| | 600 <!-- coil power -->
| |
| | 5.0 <!-- etch time -->
| |
| | 10 <!-- etch pressure -->
| |
| | 20 <!-- C4F8 flow -->
| |
| | 60 <!-- SF6 flow -->
| |
| | 5 <!-- O2 flow -->
| |
| | 400 <!-- coil power -->
| |
| | 40 <!-- platen power -->
| |
| ! New <!-- Showerhead -->
| |
| | [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly4 | 1]] <!-- link processes -->
| |
| | <!-- keywords -->
| |
| |-
| |
| | Cpoly5 <!-- step -->
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| | 30 <!-- chiller temp -->
| |
| ! 2.0 <!-- dep time -->
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| | 10 <!-- dep pressure -->
| |
| | 50 <!-- C4F8 flow -->
| |
| | 0 <!-- SF6 flow -->
| |
| | 0 <!-- O2 flow -->
| |
| | 600 <!-- coil power -->
| |
| | 5.0 <!-- etch time -->
| |
| | 10 <!-- etch pressure -->
| |
| | 20 <!-- C4F8 flow -->
| |
| | 60 <!-- SF6 flow -->
| |
| | 5 <!-- O2 flow -->
| |
| | 400 <!-- coil power -->
| |
| | 40 <!-- platen power -->
| |
| ! New <!-- Showerhead -->
| |
| | [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly5 | 1]] <!-- link processes -->
| |
| | <!-- keywords -->
| |
| |- | | |- |
| |} | | |} |
