Specific Process Knowledge/Thin film deposition/thermalevaporator: Difference between revisions
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== | ==Thermal evaporator- A system for deposition of metals== | ||
[[Image:IMG_2592_edit.jpg|300x300px|thumb| positioned in cleanroom A-1.]] | [[Image:IMG_2592_edit.jpg|300x300px|thumb| positioned in cleanroom A-1.]] | ||
Revision as of 15:19, 12 October 2017
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Thermal evaporator- A system for deposition of metals
The user manual, APV, technical information and contact information can be found in LabManager:
Thermal Evaporator in LabManager
Process information
Materials for thermal evaporator evaporation
Purpose | Deposition of metals and silicon |
|
---|---|---|
Performance | Film thickness |
|
Deposition rate |
| |
Process parameter range | Process Temperature |
|
Process pressure |
| |
Substrates | Batch size |
|
Substrate material allowed |
| |
Material allowed on the substrate |
|
* For thicknesses above 200 nm permission is requested.