Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions
| Line 11: | Line 11: | ||
[[Image:7-up_RR3.jpg|300x300px|right|thumb|Wafer clean bath in cleanroom D3. <br\> -Up to 25 wafers of 4" or 6" at a time.<br\> -Materials allowed: Silicon, Poly Silicon, Silicon Oxide, Silicon Nitride, Silicon Oxynitride,Quartz/fused silica]] | [[Image:7-up_RR3.jpg|300x300px|right|thumb|Wafer clean bath in cleanroom D3. <br\> -Up to 25 wafers of 4" or 6" at a time.<br\> -Materials allowed: Silicon, Poly Silicon, Silicon Oxide, Silicon Nitride, Silicon Oxynitride,Quartz/fused silica]] | ||
[[Image:7-up_Mask.jpg|300x300px|right|thumb|Mask clean in cleanroom D3:<br\> -Up to 25 glass wafers of 4" at a time or 4 masks.<br\> -Materials allowed: Silicon, Poly Silicon, Silicon Oxide, Silicon Nitride, Silicon Oxynitride, Quartz/fused silica, glass (Pyrex and Soda Lime), chromium]] | [[Image:7-up_Mask.jpg|300x300px|right|thumb|Mask clean in cleanroom D3:<br\> -Up to 25 glass wafers of 4" at a time or 4 masks.<br\> -Materials allowed: Silicon, Poly Silicon, Silicon Oxide, Silicon Nitride, Silicon Oxynitride, Quartz/fused silica, glass (Pyrex and Soda Lime), chromium]] | ||
[[Image:7-up_RR3.jpg|300x300px|right|thumb|Fume hood 01 and 02 in cleanroom D3<br\> -Up to 19 wafers of 4" at a time.<br\> -Materials allowed: Silicon, Silicon oxide, Silicon nitride, PolySi]] | |||
'''The user manual, user APV and contact information can be found in LabManager:''' | '''The user manual, user APV and contact information can be found in LabManager:''' | ||