Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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The 2" coater station is equipped with 2 different resists lines: | The 2" coater station is equipped with 2 different resists lines: | ||
*AZ 5214E | |||
*AR-P 6200.09 (CSAR) | *AR-P 6200.09 (CSAR) | ||
and | and | ||
*1 syringe, which can be used for various resists. | *1 syringe, which can be used for various resists. | ||
The 4"/6" coater station is equipped with 4 different resists lines: | The 4"/6" coater station is equipped with 4 different resists lines: | ||
*AZ 5214E | |||
*AZ MiR 701 | |||
*AR-P 6200.09 (CSAR) | *AR-P 6200.09 (CSAR) | ||
*AZ 4562 | |||
*AZ 4562 | |||
The processes that are available on the system are developed by Danchip. Upon request, it is possible to establish new processes. Use of the syringe requires special training, and would as a starting point require batches in excess of 20 wafers. | The processes that are available on the system are developed by Danchip. Upon request, it is possible to establish new processes. Use of the syringe requires special training, and would as a starting point require batches in excess of 20 wafers. | ||