Specific Process Knowledge/Thin film deposition/Physimeca: Difference between revisions
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|style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"| | |style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"| | ||
*10 Å - 5000 Å* | *10 Å - 5000 Å* | ||
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|style="background:LightGrey; color:black"|Available metals and deposition rates (Å/s) | |style="background:LightGrey; color:black"|Available metals and deposition rates (Å/s) | ||
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*Silver (Ag) | *Silver (Ag) | ||
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!style="background:silver; color:black" align="left" valign="top" rowspan=" | !style="background:silver; color:black" align="left" valign="top" rowspan="3"|Process parameter range | ||
|style="background:LightGrey; color:black"|Process Temperature | |style="background:LightGrey; color:black"|Process Temperature | ||
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|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* 2x10<sup>-6</sup> mbar | * 2x10<sup>-6</sup> mbar | ||
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|style="background:LightGrey; color:black"|Distance between e-beam and substrate | |||
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* 46 cm | |||
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!style="background:silver; color:black" align="left" valign="top" rowspan="3"|Substrates | !style="background:silver; color:black" align="left" valign="top" rowspan="3"|Substrates | ||