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Specific Process Knowledge/Etch/Wet Aluminium Etch: Difference between revisions

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Choi (talk | contribs)
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|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!Location
!Location
|'Aluminium Etch' bath in Wet Bench 05
|[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=381 Aluminium Etch] bath inside [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=413 Wet Bench 05] in D-3
|Beaker in Fumehood 01 or 02
|Beaker in Fumehood [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=368 01] or [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=369 02] in D-3
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Size of substrate
!Size of substrate
|*4" wafers
*6" wafers
|4" wafers
|4" wafers
6" wafers
|Any size that fits in beaker
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!Allowed materials
!Allowed materials
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*Aluminium
See the [http://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=381 Cross Contamination Sheet] for Aluminium Etch bath
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Any material allowed in cleanroom
*Photoresist
*E-beam resist
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