Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions

Revision as of 13:39, 8 August 2017 view source Lgpe (talk \| contribs) DCH-Employees-701, NLAB-Employees-701 353 edits m →Simple sdf and jdf files ← Older edit		Revision as of 13:43, 8 August 2017 view source Lgpe (talk \| contribs) DCH-Employees-701, NLAB-Employees-701 353 edits m →Alignment and global mark detection Newer edit →
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	CHIPAL V1/V4:		CHIPAL V1/V4:

	The virtual CHIPAL command in the sdf-file, CHIPAL V1 or CHIPAL V4, can be used to measure the height of the substrate at well-defined positions on the substrate, thus correcting for height variations before pattern writing. To use this, HSWITCH should be set to 'HSWITCH OFF,ON' or 'HSWITCH ~~OFF~~,ON'.		The virtual CHIPAL command in the sdf-file, CHIPAL V1 or CHIPAL V4, can be used to measure the height of the substrate at well-defined positions on the substrate, thus correcting for height variations before pattern writing. To use this, HSWITCH should be set to 'HSWITCH OFF,ON' or 'HSWITCH ON,ON'.